Thin Film Optics

Simulation of Thin Films

Dielectric thin film coatings of optical components and systems is a key to innovative and successful products. For their design and dimensioning the calculation and modelling of reflective and transmissive properties of substrates and thin films are vital.

With the use of matrix-algorithms the spectral performance of various wavelengths and incident angles can be calculated. We solve such questions with the help of software packages like TFCalc and FilmStar, e.g. from simple layer calculations to optimization tasks or analysis of existing spectral curves.

Fabrication of Thin Films

Within the scope of cooperation projects the MNT develops optical thin films or layer systems. Various methods, including coating processes like evaporation of single layers and simple anti-reflective or high-reflective coatings, are used. With our coating system OPTIMA we can produce dielectric multi layer systems on small samples by ion-assisted sputtering.

Furthermore, we operate a PECVD system for low temperature deposition of silicon dioxide (SiO2), silicon nitride (Si3N4) and oxynitrides (SiOxNy)

Thin Film Analytics

One of our core services we provide is the characterisation of optical thin films and layer systems. We determine the most important parameters of each layer including dispersion curves, spectral progression of refractive index, losses and thickness of your layer.

Furthermore we can determine the dispersion curve of your substrates as well as the spectral characteristics of your layer systems. For this task we use prism couplers by Metricon (m-line spectroscopy), reflection spectrometers, spectral photometers and optical spectrum analysers.

Measurement methods