Photoresists

NameProperties
Microposit S1813,S1828 G2:Positive Photoresist (~1.3-3µm)
Microchemicals TI 35 ES:Image Reversal Resist for Lift-Off(~3-4.5µm)
Clariant AZ9260:Positive Thick Resist (~6-20µm)
Clariant AZ4560:Positive Thick Resist  (~5-9µm)
Clariant AZ nLoF 2035/2070:i-Line Resist for Lift-Off (~3.5-7µm)
SU8 2002,2025,2050,2100:Negative Thick Resist , high Aspect Ratios possible, Used as Functional Layer or for LIGA-Processes
Microchem LOR:Lift-Off Resist for Bi-Layer Systems, not photosensitive
Micro Resist ma-N420:Negative Photoresist (~1.5-3.5µm)
Elpemer SD 2467 SG-DG:2-Component Solder Resist
Ordyl Alpha 300:Dry Resist to laminate